Fine-grained base electrode process for Pb-alloy Josephson technologyA.A. BrightS. Klepner1983JVSTAPaper
Schottky barrier formation at Pd, Pt, and Ni/Si(111) interfacesR.J. PurtellG. Hollingeret al.1983JVSTAPaper
Summary Abstract: Preparation and properties of granular aluminum in plasma-polymerized matricesM. HecqP. Ziemanet al.1983JVSTAPaper
Oxygen chemisorption and oxide formation on Si(111) and Si(100) surfacesG. HollingerF.J. Himpsel1983JVSTAPaper
Importance of chain reactions in the plasma deposition of hydrogenated amorphous siliconIvan Haller1983JVSTAPaper
Preparation of Pb-Bi film by alloy evaporation II. Microstructure and morphologyH.-C.W. HuangC.M. Serrano1983JVSTAPaper
Summary Abstract: Developments in broad-beam ion source technology and applicationsH.R. KaufmanJ.J. Cuomo1983JVSTAPaper
Summary Abstract: Preparation of Pb-Bi film by alloy evaporation II. Microstructure and morphologyH.-C.W. HuangC.M. Serrano1983JVSTAPaper