Test of structural models for Ag{110}1 2-0 by LEED intensity analysisE. ZanazziM. Magliettaet al.1983JVSTAPaper
Chemical bonding and reactions at Ti/Si and Ti/oxygen/Si interfacesR. BlitzG.W. Rubloffet al.1983JVSTAPaper
Effect of surface chemistry and work function in secondary ion mass spectrometryMing L. Yu1983JVSTAPaper
Summary Abstract: Cluster formation and the percolation threshold in thin Au filmsR.B. LaibowitzE.I. Alessandriniet al.1983JVSTAPaper
Correlation between the ion bombardment during film growth of Pd films and their structural and electrical propertiesP. ZiemannE. Kay1983JVSTAPaper
Summary Abstract: Preparation and properties of granular aluminum in plasma-polymerized matricesM. HecqP. Ziemanet al.1983JVSTAPaper
Importance of chain reactions in the plasma deposition of hydrogenated amorphous siliconIvan Haller1983JVSTAPaper
Summary Abstract: Crystallographic structure of coevaporated Ni-Al alloy filmsH.T.G. HentzellB. Anderssonet al.1983JVSTAPaper
Oxygen chemisorption and oxide formation on Si(111) and Si(100) surfacesG. HollingerF.J. Himpsel1983JVSTAPaper