Summary Abstract: Developments in broad-beam ion source technology and applicationsH.R. KaufmanJ.J. Cuomo1983JVSTA
Schottky barrier formation at Pd, Pt, and Ni/Si(111) interfacesR.J. PurtellG. Hollingeret al.1983JVSTA
Summary Abstract: Preparation and properties of granular aluminum in plasma-polymerized matricesM. HecqP. Ziemanet al.1983JVSTA
Preparation of Pb-Bi film by alloy evaporation II. Microstructure and morphologyH.-C.W. HuangC.M. Serrano1983JVSTA
Importance of chain reactions in the plasma deposition of hydrogenated amorphous siliconIvan Haller1983JVSTA
Oxygen chemisorption and oxide formation on Si(111) and Si(100) surfacesG. HollingerF.J. Himpsel1983JVSTA