A combination fingerprint classifier
- A.W. Senior
- 2001
- IEEE Transactions on Pattern Analysis and Machine Intelligence
Publications
3544 results for Mathematical Sciences
The L∞ Voronoi diagram of segments and VLSI applications
- Evanthia Papadopoulou
- D.T. Lee
- 2001
- International Journal of Computational Geometry and Applications
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Post-modification as a way to improve the lithographic performance of resist materials
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Characterization of new aromatic polymers for 157 nm photoresist applications
- N. Fender
- P.J. Brock
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Line edge roughness in positive-tone chemically amplified resists: Effect of additives and processing conditions
- Qinghuang Lin
- Dario L. Goldfarb
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base
- William Hinsberg
- Seok-Won Lee
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
High resolution patterning in chemically amplified resists: The effect of film thickness
- David R. Medeiros
- Wayne M. Moreau
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- T. Kajita
- Y. Nishimura
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering