The relationship between deposition conditions, the beta to alpha phase transformation, and stress relaxation in tantalum thin films
- L. Clevenger
- A. Mutscheller
- et al.
- 1992
- Journal of Applied Physics
Publications
2360 results at Journal of Applied Physics
Interstitial oxygen reduction in silicon at thermal donor temperatures
- M.P. Guse
- R.L. Kleinhenz
- 1992
- Journal of Applied Physics
Temperature measurements of polyimide during KrF excimer laser ablation
- D.P. Brunco
- Michael O. Thompson
- et al.
- 1992
- Journal of Applied Physics
Properties of NiFe-N films prepared by rf sputtering in nitrogen-argon gas mixtures
- K.K. Shih
- M.E. Re
- et al.
- 1992
- Journal of Applied Physics
Photothermal description of polymer ablation: Absorption behavior and degradation time scales
- Stephen R. Cain
- F.C. Burns
- et al.
- 1992
- Journal of Applied Physics
Deposition of amorphous silicon using a tubular reactor with concentric-electrode confinement
- J.P. Conde
- K.K. Chan
- et al.
- 1992
- Journal of Applied Physics
The chemisorption and reaction of BCl3 with Si(111)
- D.A. Lapiano-Smith
- F.R. McFeely
- 1992
- Journal of Applied Physics
Modeling of agglomeration in polycrystalline thin films: Application to TiSi2 on a silicon substrate
- T.P. Nolan
- R. Sinclair
- et al.
- 1992
- Journal of Applied Physics
Tantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of nitrogen additions
- Karen Holloway
- Peter M. Fryer
- et al.
- 1992
- Journal of Applied Physics
The dominant diffusing species and initial phase formation in Al-Cu, Mg-Cu, and Mg-Ni systems
- Q.Z. Hong
- F.M. D'Heurle
- 1992
- Journal of Applied Physics