Reactive Ion Etching of PECVD n+ a-Si:H: Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor PreparationM.S. Crowder2019JES
A Study of the Copper/Cyanide Solution Interphase by Polarization Modulated FT-IR SpectroscopyJ.G. GordonW.G. Goldenet al.2019JES
Reactive ion Etching of Silicon and Silicon Dioxide in CF4 Plasmas Containing H2 or C2F4 AdditivesJ.P. Simko2019JES
The Effect of Cyanide on the Oxidation of Formaldehyde on Au, Cu, and Pd ElectrodesJean Horkans2019JES
Selective dry etching of germanium with respect to silicon and vice versaG.S. OehrleinT.D. Bestwicket al.2019JES
Corrosion of Thin Film Magnetic Disk: Galvanic Effects of the Carbon OvercoatD. EdmonsonMichael A. Russaket al.2019JES