Sidewall Spacer Technology for MOS and Bipolar Devices
- Sang H. Dhong
- Edward J. Petrillo
- 2019
- JES
Publications
509 results at JES
Removal of Fluorocarbon Residues on CF4/H2 Reactive-ion-Etched Silicon Surfaces Using a Hydrogen Plasma
- J. Simko
- G.S. Oehrlein
- et al.
- 2019
- JES
In Situ X-Ray Absorption Study of Chromium Valency Changes in Passive Oxides on Sputtered ALCr Thin Films Under Electrochemical Control
- A.J. Davenport
- H.S. Isaacs
- et al.
- 2019
- JES
Monitoring the Growth of an Oxide Film on Aluminum In Situ with the Quartz Crystal Microbalance
- Owen R. Melroy
- 2019
- JES
PtSi-Induced Junction Leakage
- J.P. Gambino
- M.D. Monkowski
- et al.
- 2019
- JES
Corrosion and Passivation of Fe and FeN Films
- V. Brusic
- G.S. Frankel
- et al.
- 2019
- JES
X-Ray Damage Considerations in MOSFET Devices
- J.R. Maldonado
- S.S. Iyer
- 2019
- JES
Mechanisms of Electroless Metal Plating: I. Application of the Mixed Potential Theory
- Perminder Bindra
- Judith Tweedie
- 2019
- JES
Investigation of Reactive-Ion-Etching-Related Fluorocarbon Film Deposition onto Silicon and a New Method for Surface Residue Removal
- G.S. Oehrlein
- J.G. Clabes
- et al.
- 2019
- JES
The Polycrystalline-Si Contact to GaAs
- P.D. Kirchner
- J.M. Woodall
- et al.
- 2019
- JES