IBM 193nm semiconductor resist: Material properties, resist characteristics and lithographic performance
- P. Rao Varanasi
- Ann Marie Mewherter
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Paper
Publications
26853 results for Science
Discussion of paper `Minimum message length and Kolmogorov complexity' by C. S. Wallace and D. L. Dowe
- J. Rissanen
- 1999
- Computer Journal
PaperConversion of bulk CMOS circuits to SOI technology and its noise impact
- L.K. Wang
- Howard H. Chen
- 1999
- International Symposium on VLSI Technology, Systems, and Applications, Proceedings
PaperModified barrier-augmented Lagrangian method for constrained minimization
- Donald Goldfarb
- R. Polyak
- et al.
- 1999
- COAP
PaperMagneto-optical measurements of Co-Pt (111) multilayers
- Richard A. Fry
- Lawrence H. Bennett
- et al.
- 1999
- Journal of Magnetism and Magnetic Materials
PaperA novel processing aid for polymer extrusion: Rheology and processing of polyethylene and hyperbranched polymer blends
- Ye Hong
- J.J. Cooper-White
- et al.
- 1999
- Journal of Rheology
PaperFabrication of multilayer ferroelectric films
- Deborah A. Neumayer
- Peter R. Duncombe
- et al.
- 1999
- Integrated Ferroelectrics
PaperInterdiffusion studies of single crystal TiN/NbN superlattice thin films
- C. Engström
- J. Birch
- et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperAnisotropy scaling close to the ab plane in (formula presented) by torque magnetometry
- A. Revcolevschi
- H. Keller
- 1999
- Physical Review B - CMMP
PaperMultistream input: An experimental study of document scrolling methods
- Shumin Zhai
- Barton A. Smith
- 1999
- IBM Systems Journal
Paper