Polymer platform dependent characteristics of 193 nm photoresists
- Juliann Opitz
- R.D. Allen
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paper
Publications
26855 results for Science
Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- Zhijian G. Lu
- Yuping Cui
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paperExperimental method for quantifying acid diffusion in chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paperNMR analysis of chemically amplified resist films
- Hiroshi Ito
- M.H. Sherwood
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paperChemically amplified resists: Past, present, and future
- Hiroshi Ito
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paperHigh resolution 248 nm bilayer resist
- Q. Lin
- K.E. Petrillo
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paperReduction of intrinsic stress in cubic boron nitride films
- J. Ullmann
- A.J. Kellock
- et al.
- 1999
- Thin Solid Films
Paper5×5 2D AFM cantilever arrays a first step towards a Terabit storage device
- M.I. Lutwyche
- C. Andreoli
- et al.
- 1999
- Sensors and Actuators, A: Physical
PaperCombined Effects Due to Phase, Intensity, and Contrast in Electrooptic Modulation: Application to Ferroelectric Materials
- Laurent Guilbert
- Jean Paul Salvestrini
- et al.
- 1999
- IEEE JQE
PaperUse of the Gibbs sampler to invert large, possibly sparse, positive definite matrices
- David A. Harville
- 1999
- Linear Algebra and Its Applications
Paper