Effects of a stress field on boron ion implantation damage in silicon
- J.D. Mis
- S. Mader
- et al.
- 1993
- Journal of Applied Physics
Paper
Publications
2360 results at Journal of Applied Physics
Phase formation and microstructure changes in tantalum thin films induced by bias sputtering
- Philippe Catania
- Ronnen A. Roy
- et al.
- 1993
- Journal of Applied Physics
PaperStructural properties of Co/Au superlattices investigated by high-resolution transmission electron microscopy
- A. Mitwalsky
- K. Spörl
- et al.
- 1993
- Journal of Applied Physics
PaperAtomic scale friction of a diamond tip on diamond (100) and (111) surfaces
- Geoffrey J. Germann
- Sidney R. Cohen
- et al.
- 1993
- Journal of Applied Physics
PaperMicrostructure and homogeneity in (In,Mn)As III-V-based diluted magnetic semiconductor epitaxial films
- S. Guha
- H. Munekata
- 1993
- Journal of Applied Physics
PaperA photoluminescence study of CF4 reactive-ion-etched silicon: Various process conditions and magnetically enhanced etching
- A. Henry
- B. Monemar
- et al.
- 1993
- Journal of Applied Physics
PaperProperties of Co-N, Co-Fe-N, and Co-Zr-N films prepared by rf sputtering in nitrogen-argon gas mixtures
- K.K. Shih
- J. Karasinski
- 1993
- Journal of Applied Physics
PaperMicrostructural changes in confined submicrometer aluminum films
- M.L. Chou
- S. Rishton
- et al.
- 1993
- Journal of Applied Physics
PaperLaser ablative hole formation in amorphous thin films
- A. Blatter
- C. Ortiz
- 1993
- Journal of Applied Physics
PaperMeasurement of thermal stress and stress relaxation in confined metal lines. I. Stresses during thermal cycling
- M.A. Moske
- P.S. Ho
- et al.
- 1993
- Journal of Applied Physics
Paper