Toward controlled resist line edge roughness: Material origin of line edge roughness in chemically amplified positive-tone resists
- Q. Lin
- R. Sooriyakumaran
- et al.
- 2000
- Microlithography 2000
Conference paper
Publications
26858 results for Science
Dissolution/swelling behavior of cycloolefin polymers in aqueous base
- Hiroshi Ito
- R.D. Allen
- et al.
- 2000
- Microlithography 2000
Conference paperReal-time analysis of volatiles formed during processing of a chemically amplified resist
- F.A. Houle
- G.M. Poliskie
- et al.
- 2000
- Microlithography 2000
Conference paperEffect of resist components on image spreading during postexposure bake of chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2000
- Microlithography 2000
Conference paperSynthesis and lithographic performance of poly-4-hydroxyphenyl ethyl methacrylate based negative resists
- J. Gelorme
- L.L. Kosbar
- et al.
- 2000
- Microlithography 2000
Conference paperStructural control of the surface-frozen layer in alcohol melts
- O. Gang
- B.M. Ocko
- et al.
- 2000
- Journal of Physics Condensed Matter
PaperPhased development of a Web-based PACS viewer
- Yoad Gidron
- Uri Shani
- et al.
- 2000
- SPIE Medical Imaging 2000
Conference paperScalable SDH/SONET framer architecture for DATACOM and TELCO applications
- A. Herkersdorf
- P. Buchmann
- et al.
- 2000
- International Zurich Seminar on Broadband Communications 2000
Conference paperAdvanced Infrared (AIr): Physical layer for reliable transmission and medium access
- F.R. Gfeller
- W. Hirt
- 2000
- International Zurich Seminar on Broadband Communications 2000
Conference paperPACS viewer inter-operability for teleconsultation based on DICOM
- E. Salant
- Uri Shani
- 2000
- SPIE Medical Imaging 2000
Conference paper