Stress evolution due to electromigration in confined metal lines
- M.A. Korhonen
- P. Borgesen
- et al.
- 1993
- Journal of Applied Physics
Paper
Publications
2360 results at Journal of Applied Physics
Methyl- and dimethyl-associated paramagnetic centers in SiO2 thin films
- M. Hoinkis
- M.S. Crowder
- et al.
- 1993
- Journal of Applied Physics
PaperMagneto-optical studies of Sm(Fe,Ti)12 perpendicular textured sputtered films
- F.J. Cadieu
- A. Navarathna
- et al.
- 1993
- Journal of Applied Physics
PaperLaser ablative hole formation in amorphous thin films
- A. Blatter
- C. Ortiz
- 1993
- Journal of Applied Physics
PaperCrystallization of coevaporated and ion-irradiated amorphous CoSi 2
- Q.Z. Hong
- K. Barmak
- et al.
- 1993
- Journal of Applied Physics
PaperMeasurement of thermal stress and stress relaxation in confined metal lines. I. Stresses during thermal cycling
- M.A. Moske
- P.S. Ho
- et al.
- 1993
- Journal of Applied Physics
PaperMicrostructural changes in confined submicrometer aluminum films
- M.L. Chou
- S. Rishton
- et al.
- 1993
- Journal of Applied Physics
PaperEffect of gas impurity and ion bombardment on stresses in sputter-deposited thin films: A molecular-dynamics approach
- C.C. Fang
- F. Jones
- et al.
- 1993
- Journal of Applied Physics
PaperElectron paramagnetic resonance investigation of charge trapping centers in amorphous silicon nitride films
- W.L. Warren
- Jerzy Kanicki
- et al.
- 1993
- Journal of Applied Physics
PaperDepth profiling of the Ge concentration in SiGe alloys using in situ ellipsometry during reactive-ion etching
- G.M.W. Kroesen
- G.S. Oehrlein
- et al.
- 1993
- Journal of Applied Physics
Paper