Temperature distribution in an ideal azimuthally symmetric chemicalvapor-deposition reactor
- David E. Kotecki
- Richard A. Conti
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
Date
Featured collections
Popular topics
357 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Etching of silicon in low-pressure plasmas containing fluorine and oxygen: A comparison of real-time and postplasma surface studies
- Gottlieb S. Oehrlein
- Gerrit M.W. Kroesen
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Differential method for measuring coverage-dependent adsorption probabilities
- John G. Wilman
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The use of secondary ion mass spectrometry to investigate copolymer enhanced adhesion between immiscible polymers
- V.R. Deline
- H.R. Brown
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Helium plasma enhanced chemical vapor deposited oxides and nitrides: Process mechanisms and applications in advanced device structures
- A.A. Bright
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Collimated magnetron sputter deposition
- S.M. Rossnagel
- D.J. Mikalsen
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface etching and roughening in integrated processing of thermal oxides
- M. Offenberg
- M. liehr
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Relation of thickness and some physical properties of NiFe thin films
- R.M. Valletta
- G. Guthmiller
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Characterization of epitaxial thin films by x-ray diffraction
- Armin Segmuller
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Ion-beam sputtered diamond-like carbon with densities of 2.9 g/cc
- Jerome J. Cuomo
- John Bruley
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films