Image placement errors in x-ray masks induced by changes in resist stress during electron-beam writing
- R.E. Acosta
- Denise Puisto
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Publications
168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes
- D.L. Laird
- R. Engelstad
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Role of gas phase reactions in subatmospheric chemical-vapor deposition ozone/TEOS processes for oxide deposition
- I.A. Shareef
- G.W. Rubloff
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
The electrostatic moving objective lens and optimized deflection systems for microcolumns
- M.G.R. Thomson
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Studying membranes with scanning force microscopy and patch-clamp technique
- J. Mosbacher
- W. Häberle
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Scanning force microscopy in the dynamic mode using microfabricated capacitive sensors
- N. Blanc
- J. Brugger
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Design and performance analysis of a three-dimensional sample translation device used in ultrahigh vacuum scanned probe microscopy
- R.R. Schlittler
- J.K. Gimzewski
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Cu metallization using a permanent magnet electron cyclotron resonance microwave plasma/sputtering hybrid system
- S.M. Gorbatkin
- D.B. Poker
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
An inquiry concerning the principles of Si 2p core-level photoemission shift assignments at the Si/SiO2 interface
- F.R. McFeely
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Correlation of UVIIHS resist chemistry to dissolution rate measurements
- J. Thackeray
- T.H. Fedynyshyn
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures