Publications

3548 results for Mathematical Sciences

Rinse additives for line edge roughness control in 193 nm lithography
- - Dario L. Goldfarb
  - Sean D. Burns
  - et al.
- 2004
- Microlithography 2004
Liquid immersion lithography - Evaluation of resist issues
- - William Hinsberg
  - Gregory Wallraff
  - et al.
- 2004
- Microlithography 2004
Assessing the impact of intrinsic birefringence on 157nm lithography
- - Nakgeuon Seong
  - Kafai Lai
  - et al.
- 2004
- SPIE Advanced Lithography 2004
Optimized acid release underlayers for 157 nm lithography
- - Carl E. Larson
  - G.M. Wallraff
  - et al.
- 2004
- Microlithography 2004
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- - R. Sooriyakumaran
  - B. Davis
  - et al.
- 2004
- Microlithography 2004
Rinse additives for defect suppression in 193 nm and 248 nm lithography
- - Spyridon Skordas
  - Ryan L. Burns
  - et al.
- 2004
- Microlithography 2004
Reactive dissolution kinetics of lithographic copolymers
- - William Hinsberg
  - Frances Houle
  - et al.
- 2004
- Microlithography 2004
High speed, lateral PIN photodiodes in silicon technologies
- - Jeremy D. Schaub
  - Steven J. Koester
  - et al.
- 2004
- SPIE IOPTO 2004
Taming pattern and focus variation in VLSI design
- - Fook-Luen Heng
  - Puneet Gupta
  - et al.
- 2004
- AMM 2004
Merits of cellwise model-based OPC
- - Puneet Gupta
  - Fook-Luen Heng
  - et al.
- 2004
- AMM 2004