Far‐ultraviolet laser ablation of the cornea: Photoacoustic studies
- R. Srinivasan
- Peter E. Dyer
- et al.
- 2005
- Lasers in Surgery and Medicine
Publications
1888 results for Impact Science
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005
Perfluoropolyethers as novel materials for soft lithography
- Jason P. Rolland
- Eric C. Hagberg
- et al.
- 2005
- Microlithography 2005
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- Microlithography 2005
Line edge roughness reduction by plasma curing photoresists
- Arpan P. Mahorowala
- Kuang-Jung Chen
- et al.
- 2005
- Microlithography 2005
Looking into the crystal ball: Future device learning using hybrid E-beam and optical lithography
- S.E. Steen
- S.J. McNab
- et al.
- 2005
- Microlithography 2005
Silsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluation
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- Microlithography 2005
Interfacial structure of photoresist thin films in developer solutions
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Microlithography 2005
Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- Microlithography 2005
Progress towards developing high performance immersion compatible materials and processes
- Karen Petrillo
- Kaushal Patel
- et al.
- 2005
- Microlithography 2005