Molecular Dynamics Modeling of Microstructure and Stresses in Sputter-Deposited Thin Films
- F. Jones
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Selective reactive ion etching of phosphorus-doped oxide over undoped SiO2
- David Vender
- Gottlieb S. Oehrlein
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electromagnetic fields in a radio-frequency induction plasma
- J. Hopwood
- C.R. Guarnieri
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Langmuir probe measurements of a radio frequency induction plasma
- J. Hopwood
- C.R. Guarnieri
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effects of ion bombardment in plasma etching on the fluorinated silicon surface layer: Real-time and postplasma surface studies
- Gottlieb S. Oehrlein
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Characterization of a radio frequency plasma source for molecular beam epitaxial growth of high-7c superconductor films
- Jean-Pierre Locciuet
- Erich Mächler
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Photoreflectance study of the surface Fermi level at (001) n- and p-type GaAs surfaces
- X. Yin
- H.-M. Chen
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Energetic carbon deposition at oblique angles
- John Bruley
- David L. Pappas
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
An isotope approach to characterization of microwave water plasma modified polyimide surfaces
- N.J. Chou
- A.D. Marwick
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Highly reflective x-ray mirror
- Philip Catania
- James P. Doyle
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films