Combined Experimental and Modeling Study of Spatial Effects in Plasma Etching: CF4/O2 Etching of Silicon
- M. Dalvie
- K.F. Jensen
- 2019
- JES
Publications
509 results at JES
Simulation of Leveling in Electrodeposition
- John O. Dukovic
- Charles W. Tobias
- 2019
- JES
Short Time Annealing of Coevaporated Tungsten Silicide Films
- T.O. Sedgwick
- F.M. d'Heurle
- et al.
- 2019
- JES
A new process using two photo-masks to prepare trilayer thin film transistors
- Yue Kuo
- 2019
- JES
Feature-Size Dependence of Etch Rate in Reactive Ion Etching
- Young H. Lee
- Zhen H. Zhou
- 2019
- JES
A Mathematical Model for Silicide Oxidation
- S.-L. Zhang
- R. Ghez
- et al.
- 2019
- JES
Chemical vapor deposition of gold
- Carl E. Larson
- Thomas H. Baum
- et al.
- 2019
- JES
Composition Determination of Electrodeposited NiSn and PbSn Alloys Using Stripping Voltammetry at a Rotating Ring-Disk Electrode
- K.H. Wong
- P.C. Andricacos
- 2019
- JES
Plating of Copper into Through-Holes and Vias
- Richard C. Alkire
- Lubomyr T. Romankiw
- 2019
- JES
Interaction Between ti and SiO2
- C.-Y. Ting
- M. Wittmer
- et al.
- 2019
- JES