Dissolution fundamentals of 193-nm methacrylate based photoresists
- Ashwin Rao
- Shuhui Kang
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paper
Publications
3605 results for Mathematical Sciences
Direct determination of photoresist composition changes during UV exposure
- Frances A. Houle
- Vaughn R. Deline
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperCharacterization of Across-device Linewidth Variation (ADLV) for 65 nm logic SRAM using CDSEM and linewidth roughness algorithms
- W. Chu
- C. Radens
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperOrganic nonlinear Kerr materials in fabry-perot cavities for all optical switching
- Nikola Moll
- Selim Jochim
- et al.
- 2006
- SPIE IOPTO 2006
Conference paperA year in the life of an immersion lithography alpha tool at albany NanoTech
- Michael Tittnich
- John Hartley
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperMinimum classification error training for online handwriting recognition
- Alain Biem
- 2006
- IEEE Transactions on Pattern Analysis and Machine Intelligence
PaperSimple ergodic and outage capacity expressions for correlated diversity ricean fading channels
- Simeon Furrer
- Pedro Coronel
- et al.
- 2006
- IEEE TWC
PaperGersgorin variations II: On themes of Fan and Gudkov
- Alan J. Hoffman
- 2006
- Advances in Computational Mathematics
PaperChallenges for the introduction of board-level optical interconnect technology into product development roadmaps
- Christoph Berger
- Bert Jan Offrein
- et al.
- 2006
- SPIE IOPTO 2006
Conference paperChallenges and opportunities for integrated optics in computing systems
- Marc A. Taubenblatt
- 2006
- SPIE IOPTO 2006
Conference paper