Modification of the PHI sample mount for multiple- or micropositioning for Zalar rotation
- Paul Soo
- David L. Neiman
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Directionality of Sputtered Cu Atoms in A Hollow Cathode Enhanced Planar Magnetron
- S.M. Rossnagel
- J.J. Cuomo
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Kinetic model for the chemical vapor deposition of tungsten in the silane reduction process
- Julian J. Hsieh
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effects of substrate bias frequency in an electron cyclotron resonance plasma reactor
- W.M. Holber
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Influence of energy reflected from the target on thin film characteristics
- Harold F. Winters
- H. Coufal
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Chemistry and morphology of Cr/BPDA-PDA interface formation
- Steven G. Anderson
- Jihperng Leu
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive Ion Etching of Sige Alloys using Fluorine-Containing Plasmas *
- James W. Corbett
- Gottlieb S. Oehrlein
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reflection High-Energy Electron Diffraction Intensity Monitored Homoepitaxial Growth of Srtio3 Buffer Layer by Pulsed Laser Deposition
- M.Y. Chern
- A. Gupta
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Influence of surface-activated reaction kinetics on low-pressure chemical vapor deposition conformality over micro features
- Julian J. Hsieh
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Copper deposition by electron cyclotron resonance plasma
- A. Sugerrnan
- F.E. Turene
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films