Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- O.R. Wood II
- D. Back
- et al.
- 2007
- SPIE Advanced Lithography 2007
Publications
3593 results for Mathematical Sciences
Use of starburst patterns in optical lithography
- M. Burkhardt
- Cyrus Tabery
- 2007
- SPIE Advanced Lithography 2007
Coupling-aware mixed dummy metal insertion for lithography
- Liang Deng
- Martin D.F. Wong
- et al.
- 2007
- SPIE Advanced Lithography 2007
Setting MRC rules: Balancing inspection capabilities, defect sensitivity and OPC
- Ian Stobert
- James Bruce
- et al.
- 2007
- SPIE Advanced Lithography 2007
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nanoimprint lithography
- Frances A. Houle
- Ann Fornof
- et al.
- 2007
- SPIE Advanced Lithography 2007
Fluoroalcohol materials with tailored interfacial properties for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2007
- SPIE Advanced Lithography 2007
Distinguishing dose, focus and blur for lithography characterization and control
- Christopher P. Ausschnitt
- Timothy A. Brunner
- 2007
- SPIE Advanced Lithography 2007
High performance 193nm photoresists based on fluorosulfonamide
- Wenjie Li
- Kuang-Jung Chen
- et al.
- 2007
- SPIE Advanced Lithography 2007
OPC model data collection for 45nm technology node using automatic CD-SEM offline recipe creation
- Daniel Fischer
- Mohamed Talbi
- et al.
- 2007
- SPIE Advanced Lithography 2007
Inapproximability results for combinatorial auctions with submodular utility functions
- Subhash Khot
- Richard J. Lipton
- et al.
- 2007
- Algorithmica (New York)