Leveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes
- Narender Rana
- Yunlin Zhang
- et al.
- 2014
- SPIE Advanced Lithography 2014
Publications
14340 results for Physical Sciences
CDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wires
- Shimon Levi
- Ishai Schwarzband
- et al.
- 2014
- SPIE Advanced Lithography 2014
Closed-loop high-speed 3D thermal probe nanolithography
- Armin W. Knoll
- Michal Zientek
- et al.
- 2014
- SPIE Advanced Lithography 2014
E-beam inspection of EUV mask defects: To etch or not to etch?
- Ravi Bonam
- Hung-Yu Tien
- et al.
- 2014
- SPIE Advanced Lithography 2014
Spin-on organic hardmask for topo-patterned substrate
- Kazuhiko Komura
- Yoshi Hishiro
- et al.
- 2014
- SPIE Advanced Lithography 2014
Molecular glass resists for scanning probe lithography
- Christian Neuber
- Andreas Ringk
- et al.
- 2014
- SPIE Advanced Lithography 2014
Estimating pattern sensitivity to the printing process for varying dose/focus conditions for RET development in the sub-22nm era
- Benoit Seguin
- Henri Saab
- et al.
- 2014
- SPIE Advanced Lithography 2014
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2014
- SPIE Advanced Lithography 2014
Strain scaling for CMOS
- Stephen W. Bedell
- Ali Khakifirooz
- et al.
- 2014
- MRS Bulletin
Dissecting the contributions of β-hairpin tyrosine pairs to the folding and stability of long-lived human γd-crystallins
- Zaixing Yang
- Zhen Xia
- et al.
- 2014
- Nanoscale