Reactive dissolution kinetics of lithographic copolymers
- William Hinsberg
- Frances Houle
- et al.
- 2004
- Microlithography 2004
Conference paper
Publications
26865 results for Science
Rinse additives for defect suppression in 193 nm and 248 nm lithography
- Spyridon Skordas
- Ryan L. Burns
- et al.
- 2004
- Microlithography 2004
Conference paperOptimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
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- 2004
- Microlithography 2004
Conference paperHigh speed, lateral PIN photodiodes in silicon technologies
- Jeremy D. Schaub
- Steven J. Koester
- et al.
- 2004
- SPIE IOPTO 2004
Conference paperMining and knowledge discovery from the web
- Kevin S. McCurley
- Andrew Tomkins
- 2004
- I-SPAN 2004
Conference paperMicro-four-point-probe characterization of nanowires fabricated using the nanostencil technique
- R. Lin
- M. Bammerlin
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- 2004
- Nanotechnology
PaperAnalyzing the structure of CoFe-Fe 3O 4 core-shell nanoparticles by electron imaging and diffraction
- Jing Li
- Hao Zeng
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- 2004
- Journal of Physical Chemistry B
PaperSolution-processed inorganic semiconductors
- David B. Mitzi
- 2004
- Journal of Materials Chemistry
ReviewInvited talk: The many wonders of the web graph
- Andrei Broder
- 2004
- CAAN 2004
Conference paperA servomechanism for a micro-electromechanical-system-based scanning-probe data storage device
- A. Pantazi
- M.A. Lantz
- et al.
- 2004
- Nanotechnology
Conference paper