A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications
- S. Krishnan
- U. Kwon
- et al.
- 2011
- IEDM 2011
Publications
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14201 results for Physical Sciences
Metal-catalyzed graphitization in Ni-C alloys and amorphous-C/Ni bilayers
- Katherine L. Saenger
- Christian Lavoie
- et al.
- 2010
- MRS Fall Meeting 2010
Bottom-up modeling of the elastic properties of organosilicate glasses and their relation to composition and network defects
- Jan M. Knaup
- Han Li
- et al.
- 2010
- MRS Fall Meeting 2010
Optimizing stressor film deposition sequence in polish rate order for best planarization
- John H. Zhang
- Changyong Xiao
- et al.
- 2011
- MRS Spring Meeting 2011
Silsesquioxane-based photo-patternable porous low-k
- Dielectric Materials
- Jitendra S. Rathore
- et al.
- 2010
- MRS Spring Meeting 2010
Wafer scale fabrication of carbon nanotube FETs with embedded poly-gates
- Shu-Jen Han
- Josephine Chang
- et al.
- 2010
- IEDM 2010
High on-off ratio bilayer graphene complementary field effect transistors
- Kausik Majumdar
- Kota V. R. M. Murali
- et al.
- 2010
- IEDM 2010
The impact of hole-induced electromigration on the cycling endurance of phase change memory
- M. H. Lee
- R. Cheek
- et al.
- 2010
- IEDM 2010
Hysteretic drain-current behavior due to random telegraph noise in scaled-down FETs with high-κ/metal-gate stacks
- Hiroshi Miki
- Naoki Tega
- et al.
- 2010
- IEDM 2010
Switching distributions and write reliability of perpendicular spin torque MRAM
- D.C. Worledge
- G. Hu
- et al.
- 2010
- IEDM 2010