Model of Lead Loss in Pb(MgxNb1-x)Ozion Beam Sputtered Thin Films
- J.P. Doyle
- J.J. Cuomo
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Tribochemistry at Lubricated Interfaces
- Xiaohe Pan
- C.S. Bhatia
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Directed sputter deposition of AlCu: Film microstructure and microchemistry
- S.M. Rossnagel
- J. Moser
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF
- Y. Zhana
- D. Vender
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Adhesion durability of tantalum BPDA-PDA polyimide interfaces
- D. Neuaroschl
- B.K. Furman
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma
- M. Surendra
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Infrared absorption spectroscopy for monitoring condensible gases in chemical vapor deposition applications
- James A. O'neill
- Michael L. Passow
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Deposition of aluminum oxide films with high refractive index
- K.K. Shih
- D.B. Dove
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3
- G.S. Oehrlein
- Y. Zhang
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Simulation of surface topography evolution during plasma etching by the method of characteristics
- Manoj Dalvie
- Satoshi Hamaguchi
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films