Laser-induced chemical vapor deposition of metals for microelectronics technologyThomas H. BaumPaul B. Comita1992Thin Solid Films
Investigations on the quality of polysilicon film-gate dielectric interface in polysilicon thin film transistorsJi-Ho KungMiltiadis K. Hataliset al.1992Thin Solid Films
Reactive diffusion in a prototype system: nickel - aluminum II: The ordered Cu3Au rule and the sequence of phase formation, nucleationF.M. d'HeurleR. Ghez1992Thin Solid Films
Reactive diffusion in a prototype system: nickel-aluminum I: Non-constant diffusion coefficientF.M. d'HeurleR. Ghez1992Thin Solid Films
Stresses from solid state reactions: a simple model, silicidesS.-L. ZhangF.M. d'Heurle1992Thin Solid Films
On the stability of vapor grown palladium particles supported on amorphous aluminaG. FuchsD. Neimanet al.1992Thin Solid Films