Integration of polymer self-assembly for lithographic application
- Joy Y. Cheng
- Daniel P. Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008
Conference paper
Publications
3611 results for Mathematical Sciences
Improvements in accuracy of dense OPC models
- Chidam Kallingal
- James Oberschmidt
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Conference paperOn-chip timing uncertainty measurements on IBM microprocessors
- R.L. Franch
- P. Restle
- et al.
- 2008
- IEEE ITC 2008
Conference paperActive collaborative prediction with maximum margin matrix factorization
- Irina Rish
- Gerald Tesauro
- 2008
- ISAIM 2008
Conference paperAnalysis of retention time distribution of embedded DRAM - A new mMethod to characterize across-chip threshold voltage variation
- W. Kong
- P. Parries
- et al.
- 2008
- IEEE ITC 2008
Conference paperResist-based polarization monitoring for 193nm high-numerical aperture lithography
- Richard Tu
- Gregory McIntyre
- 2008
- Lithography Asia 2008
Conference paperWavefront generated by reflection of a plane wave from a conic section
- John A. Hoffnagle
- David L. Shealy
- 2008
- SPIE Optical Engineering + Applications 2008
Conference paperEvaluation of 32nm Advanced immersion lithography pellicles
- N. Zhou
- K. Racette
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Conference paperOptical diagnostics for IBM POWER6 TM Microprocessor
- Peilin Song
- Stephen Ippolito
- et al.
- 2008
- IEEE ITC 2008
Conference paperChallenges of implementing contour modeling in 32nm technology
- Daniel Fischer
- Geng Han
- et al.
- 2008
- SPIE Advanced Lithography 2008
Conference paper