Characteristics of chemical vapor deposition diamond films for x-ray mask substrates
- Cameron J. Brooks
- Lynn A. Powers
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PREVAIL: Operation of the electron optics proof-of-concept system
- M. Gordon
- J.E. Lieberman
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Relationship between the slope of the HD curve and the fundamental resist process contrast
- Timothy A. Brunner
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Deep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Current oscillations in thin metal-oxide-semiconductor structures observed by ballistic electron emission microscopy
- H.J. Wen
- R. Ludeke
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fabrication of Cu interconnects of 50 nm linewidth by electron-beam lithography and high-density plasma etching
- Y. Hsu
- T. Standaert
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Experimental demonstration of the validity of accelerated radiation damage testing of x-ray mask materials
- R.E. Acosta
- R. Rippstein
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Etching processes and characteristics for the fabrication of refractory x-ray masks
- Michael J. Lercel
- Cameron J. Brooks
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Interaction between gas rarefaction and metal ionization in ionized physical vapor deposition
- S.M. Rossnagel
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fabrication of electron beam generated, chirped, phase mask (1070.11-1070.66 nm) for fiber Bragg grating dispersion compensator
- R.C. Tiberio
- D.W. Carr
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures