Liquid immersion deep-ultraviolet interferometric lithography
- J. Hoffnagle
- W.D. Hinsberg
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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Publications
168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Projection reduction exposure with variable axis immersion lenses: Next generation lithography
- H.C. Pfeiffer
- R.S. Dhaliwal
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperCharacteristics of chemical vapor deposition diamond films for x-ray mask substrates
- Cameron J. Brooks
- Lynn A. Powers
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperDeep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperChallenges and progress in x-ray lithography
- Jerome P. Silverman
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperInteraction between gas rarefaction and metal ionization in ionized physical vapor deposition
- S.M. Rossnagel
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperExperimental demonstration of the validity of accelerated radiation damage testing of x-ray mask materials
- R.E. Acosta
- R. Rippstein
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperFabrication of Cu interconnects of 50 nm linewidth by electron-beam lithography and high-density plasma etching
- Y. Hsu
- T. Standaert
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperEtching processes and characteristics for the fabrication of refractory x-ray masks
- Michael J. Lercel
- Cameron J. Brooks
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperAccuracy and efficiency in electron beam proximity effect correction
- S.J. Wind
- P.D. Gerber
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper