Liquid immersion deep-ultraviolet interferometric lithography
- J. Hoffnagle
- W.D. Hinsberg
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Publications
168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Projection reduction exposure with variable axis immersion lenses: Next generation lithography
- H.C. Pfeiffer
- R.S. Dhaliwal
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Relationship between the slope of the HD curve and the fundamental resist process contrast
- Timothy A. Brunner
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Deep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Experimental demonstration of the validity of accelerated radiation damage testing of x-ray mask materials
- R.E. Acosta
- R. Rippstein
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fabrication of electron beam generated, chirped, phase mask (1070.11-1070.66 nm) for fiber Bragg grating dispersion compensator
- R.C. Tiberio
- D.W. Carr
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Current oscillations in thin metal-oxide-semiconductor structures observed by ballistic electron emission microscopy
- H.J. Wen
- R. Ludeke
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Chemically amplified resist processing with top coats for deep-ultraviolet and e-beam applications
- Karen Petrillo
- James Bucchignano
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Light-coupling masks: An alternative, lensless approach to high-resolution optical contact lithography
- Heinz Schmid
- Hans Biebuyck
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Challenges and progress in x-ray lithography
- Jerome P. Silverman
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures