High temperature reaction and defect chemistry at the Si/SiO2 interfaceK. HofmannG.W. Rubloffet al.1987Applied Surface Science
Evaluation of channel hot carrier effects in n-MOS transistors at 77 K with the charge pumping techniqueP. HeremansY.-C. Sunet al.1987Applied Surface Science
Thermal oxidation of silicon: New experimental results and modelsEugene A. IreneR. Ghez1987Applied Surface Science