Control of Plasma Etch Profiles with Plasma Sheath Electric Field and RF Power DensityR.S. Horwath2019JESPaper
Quasi-CW, high numerical aperture, inductively excited ion laserC.B. ZarowinC.K. Williams2004Applied Physics LettersPaper
Electron temperature and density in argon ion laser dischargesC.B. Zarowin2003Applied Physics LettersPaper
Theory of plasma chemical transport etching of gold in a chlorine plasmaC.B. Zarowin1981Thin Solid FilmsPaper
A Novel Approach to the Design of a Transistorized Inverter-Converter Operating at Higher Than Audio FrequenciesCharles B. ZarowinGeorge W. Lynch1972IEEE JSSCPaper