Vertical-Transport Nanosheet Technology for CMOS Scaling beyond Lateral-Transport Devices
- H. Jagannathan
- B. Anderson
- et al.
- 2021
- IEDM 2021
Publications
6 results for Jennifer Fullam
Advanced EUV Resist Characterization using Scatterometry and Machine Learning
- Daniel Schmidt
- Karen Petrillo
- et al.
- 2021
- ASMC 2021
A 14 nm embedded STT-MRAM CMOS technology
- Daniel C. Edelstein
- M. Rizzolo
- et al.
- 2020
- IEDM 2020
AFM characterization for Gate-All-Around (GAA) devices
- Mary Breton
- Jennifer Fullam
- et al.
- 2020
- SPIE Advanced Lithography 2020
Line top loss and line top roughness characterizations of EUV resists
- Daniel Schmidt
- Karen Petrillo
- et al.
- 2020
- SPIE Advanced Lithography 2020
Characterization of imaging performance for immersion lithography at NA=0.93
- Dario Gil
- Jaione Tirapu-Azpiroz
- et al.
- 2006
- SPIE Advanced Lithography 2006