Publications

28 results for Pushkara Rao Varanasi

Silsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluation
- - Hiroshi Ito
  - Hoa D. Truong
  - et al.
- 2005
- Microlithography 2005
Fluoroalcohol-methacrylate resists for 193nm lithography
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
Characterization and lithographic performance of silsesquioxane 193 nm bilayer resists
- - Hiroshi Ito
  - Hoa D. Truong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- - R. Sooriyakumaran
  - B. Davis
  - et al.
- 2004
- Microlithography 2004
IBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- - Kaushal Patel
  - Margaret Lawson
  - et al.
- 2004
- Microlithography 2004
Rational design in cyclic olefin resists for sub-100nm lithography
- - Wenjie Li
  - P. Rao Varanasi
  - et al.
- 2003
- Microlithography 2003
Impact of thin resist processes on post-etch LER
- - Arpan P. Mahorowala
  - Dario L. Goldfarb
  - et al.
- 2003
- Microlithography 2003
Evolution of a 193 nm bilayer resist for manufacturing
- - R.W. Kwong
  - M. Khojasteh
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- - Ranee Kwong
  - P. Rao Varanasi
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- - T. Kajita
  - Y. Nishimura
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering