Highly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- Dirk Pfeiffer
- Arpan Mahorowala
- et al.
- 2003
- Microlithography 2003
Publications
97 results for Karen Petrillo
Hardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Enhancement of KRS-XE for 50 keV advanced mask making applications
- Karen Petrillo
- David Medeiros
- et al.
- 2002
- SPIE Photomask Technology 2002
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- Christina Deverich
- Andrew Watts
- et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Methods for comparing contact hole shrinking techniques with 248 nm single layer and bilayer photoresists
- Karen Petrillo
- John Simons
- et al.
- 2002
- Microlithography 2002
Sensitivity factors of CAR electron beam resists
- David R. Medeiros
- Karen Petrillo
- et al.
- 2002
- Microlithography 2002
A contact-reducing method over topography by combining the RELACS technique and bi-layer process
- Chieh-Yu Lin
- Karen Petrillo
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering