Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- Luisa D. Bozano
- Phillip J. Brock
- et al.
- 2011
- SPIE Advanced Lithography 2011
Publications
8 results for Masaki Fujiwara
Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2011
- SPIE Advanced Lithography 2011
Thin film composite polyamide membrane containing hexafluoroalcohol (HFA) functionality for water desalination
- Young-Hye Na
- Ratnam Sooriyakumaran
- et al.
- 2010
- NAMS-ICIM 2010
Leveraging resist chemistry research for water purification membrane technology
- Robert D. Allen
- Young-Hye Na
- et al.
- 2010
- J. Photopolym. Sci. Tech.
High contact angle fluorosulfonamide-based materials for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Novel thin film composite membrane containing ionizable hydrophobes: PH-dependent reverse osmosis behavior and improved chlorine resistance
- Young-Hye La
- Ratnam Sooriyakumaran
- et al.
- 2010
- Journal of Materials Chemistry
Investigation of polymer-bound PAGs: Synthesis, characterization and initial structure/property relationships of anion-bound resists
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2009
- J. Photopolym. Sci. Tech.
Hybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- Hiroshi Ito
- Linda K. Sundberg
- et al.
- 2009
- SPIE Advanced Lithography 2009