Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulationsDavid MelvilleAlan E. Rosenbluthet al.2010SPIE Advanced Lithography 2010
Failure prediction across process window for robust OPCShumay D. ShangYuri Graniket al.2003SPIE Advanced Microelectronic Manufacturing 2003
Failure prediction across process window for robust OPCShumay D. ShangYuri Graniket al.2003SPIE Advanced Lithography 2003