Publications

2 results for Yuansheng Ma

Spacer defined double patterning for sub-72 nm pitch logic technology
- - Ryoung-Han Kim
  - Erin McLellan
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Overcoming the challenges of 22-nm node patterning through litho-design co-optimization
- - Martin Burkharde
  - J.C. Arnold
  - et al.
- 2009
- SPIE Advanced Lithography 2009