Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes
- Shoji Hotta
- Takumichi Sutani
- et al.
- 2011
- J. Micro/Nanolithogr. MEMS MOEMS
Publications
4 results for Daniel Moore
Spatial signature in local overlay measurements - "what CD-SEM can tell us and optical measurements can not"
- Scott Halle
- Daniel Moore
- et al.
- 2010
- SPIE Advanced Lithography 2010
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings
- Alok Vaid
- Matthew Sendelbach
- et al.
- 2010
- SPIE Advanced Lithography 2010
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry targets
- Alok Vaid
- Matthew Sendelbach
- et al.
- 2010
- Journal of Micro/Nanolithography, MEMS, and MOEMS