Publications

3 results for Anthony Scaduto

64 nm pitch Cu dual-damascene interconnects using pitch split double exposure patterning scheme
- - Shyng-Tsong Chen
  - Hideyuki Tomizawa
  - et al.
- 2011
- IITC/MAM 2011
Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator
- - Gregory McIntyre
  - Daniel Corliss
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- - Guillaume Landie
  - Yongan Xu
  - et al.
- 2011
- SPIE Advanced Lithography 2011