Publications

10 results for Rex Chen

Optimization of pitch-split double patterning phoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- ASMC 2011
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fabrication of dual damascene BEOL structures using a Multi-Level Multiple Exposure (MLME) scheme - Part 1. Lithographic patterning
- - Dario L. Goldfarb
  - Stefan Harrer
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Process characterization of pitch-split resist materials for application at 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Fabrication of dual damascene BEOL structures using a multi-level multiple exposure (MLME) scheme - Part 2. RIE-based pattern transfer and completion of dual damascene process yielding an electrically functional via chain
- - Stefan Harrer
  - John C Arnold
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
A new class of low bake resists for 193-nm immersion lithography
- - Ratnam Sooriyakumaran
  - Richard DiPietro
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Progress towards developing high performance immersion compatible materials and processes
- - Karen Petrillo
  - Kaushal Patel
  - et al.
- 2005
- Microlithography 2005
193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- - T. Kajita
  - Y. Nishimura
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Novel classes of cyclic olefin polymers for 193 nm lithography
- - P. Rao Varanasi
  - R.D. Allen
  - et al.
- 2001
- J. Photopolym. Sci. Tech.
Conducting polyaniline coatings for submicron lithography and SEM metrology
- - Teresita Graham
  - Marie Angelopoulos
  - et al.
- 1997
- Microlithography 1997