Publications

2 results for Gabriel Berger

Applicability of global source mask optimization to 22/20nm node and beyond
- - Kehan Tian
  - Moutaz Fakhry
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- - David Melville
  - Alan E. Rosenbluth
  - et al.
- 2010
- SPIE Advanced Lithography 2010