Publications

3 results for Young Kim

Applicability of global source mask optimization to 22/20nm node and beyond
- - Kehan Tian
  - Moutaz Fakhry
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- - David Melville
  - Alan E. Rosenbluth
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- - Kafai Lai
  - Alan E. Rosenbluth
  - et al.
- 2009
- SPIE Advanced Lithography 2009