Publications

9 results for Colin Brodsky

Strategies for single patterning of contacts for 32nm and 28nm technology
- - Bradley Morgenfeld
  - Ian Stobert
  - et al.
- 2011
- ASMC 2011
Contact patterning strategies for 32nm and 28nm technology
- - Bradley Morgenfeld
  - Ian Stobert
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Measuring layer-specific depth-of-focus requirements
- - Bernhard Liegl
  - Allen Gabor
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Lower resistance scaled metal contacts to silicide for advanced CMOS
- - A. Topol
  - C. Sheraw
  - et al.
- 2006
- VLSI Technology 2006
Silicon containing polymer in applications for 193 nm high NA lithography processes
- - Scan Bums
  - Dirk Pfeiffer
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Rinse additives for line edge roughness control in 193 nm lithography
- - Dario L. Goldfarb
  - Sean D. Burns
  - et al.
- 2004
- Microlithography 2004
Rinse additives for defect suppression in 193 nm and 248 nm lithography
- - Spyridon Skordas
  - Ryan L. Burns
  - et al.
- 2004
- Microlithography 2004
Highly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- - Dirk Pfeiffer
  - Arpan Mahorowala
  - et al.
- 2003
- Microlithography 2003
A high performance 90 nm SOI technology with 0.992 μm² 6T-SRAM cell
- - Mukesh Khare
  - S. Ku
  - et al.
- 2002
- IEDM 2002