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FinFET resistance mitigation through design and process optimization
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- Josephine Chang
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- 2009
- VLSI-TSA 2009
Conference paperElectro-chemical mechanical planarization and its evaluation on BEOL with 65nm node dimensions
- A. Sakamoto
- L. Economikos
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- 2005
- CMP-MIC 2005
Conference paperIntegrated electro-chemical mechanical planarization (Ecmp) for future generation device technology
- L. Economikos
- X. Wang
- et al.
- 2004
- IITC 2004
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