Optimizing stressor film deposition sequence in polish rate order for best planarization
- John H. Zhang
- Changyong Xiao
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- 2011
- MRS Spring Meeting 2011
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FinFET resistance mitigation through design and process optimization
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- L. Economikos
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Integrated electro-chemical mechanical planarization (Ecmp) for future generation device technology
- L. Economikos
- X. Wang
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- IITC 2004