Publications

4 results for Anne McGuire

Two-dimensional mask effects at the 14 nm logic node
- - A.E. Zweber
  - A.E. McGuire
  - et al.
- 2013
- SPIE Photomask Technology 2013
EUV mask line edge roughness
- - Amy E. Zweber
  - Emily Gallagher
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Advanced lithography kits: Serifs and hammerhead
- - Hang-Yip Liu
  - Steffen Schulze
  - et al.
- 2000
- Proceedings of SPIE - The International Society for Optical Engineering
Airborne chemical contamination of a chemically amplified resist
- - Scott A. MacDonald
  - N.J. Clecak
  - et al.
- 1991
- Microlithography 1991