Publications

2 results for Toshio Konishi

Using pattern shift to avoid blank defects during EUVL mask fabrication
- - Yoshiyuki Negishi
  - Yuki Fujita
  - et al.
- 2013
- Photomask and Next-Generation Lithography Mask Technology 2013
EUV mask line edge roughness
- - Amy E. Zweber
  - Emily Gallagher
  - et al.
- 2012
- SPIE Advanced Lithography 2012