A method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist-KRS
- Karen Petrillo
- James Brancaccio
- et al.
- 1997
- Microlithography 1997
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34 results for Wu-Song Huang
High resolution electron beam lithography using ZEP-520 and KRS resists at low voltage
- D.M. Tanenbaum
- C.W. Lo
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
New environmentally stable positive tone chemically amplified resist system - KRS
- Wu-Song Huang
- R.W. Kwong
- et al.
- 1993
- MRS Fall Meeting 1993
Conducting polymers as lithographic materials
- Marie Angelopoulos
- J.M. Shaw
- et al.
- 1991
- International Technical Conference on Photopolymers 1991