Publications

9 results for Kuang-Jung Chen

Development of KrF hybrid resist for a dual isolation application
- - Sen Liu
  - Steven Holmes
  - et al.
- 2013
- SPIE Advanced Lithography 2013
A silicon-containing resist for immersion lithography
- - Ratnam Sooriyakumaran
  - Wu-Song Huang
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
High performance 193nm photoresists based on fluorosulfonamide
- - Wenjie Li
  - Kuang-Jung Chen
  - et al.
- 2007
- SPIE Advanced Lithography 2007
ArF excimer laser resists based on fluoroalcohol
- - Hiroshi Ito
  - H.D. Truong
  - et al.
- 2006
- Polymers for Advanced Technologies
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- Microlithography 2005
Line edge roughness reduction by plasma curing photoresists
- - Arpan P. Mahorowala
  - Kuang-Jung Chen
  - et al.
- 2005
- Microlithography 2005
Fluoroalcohol-methacrylate resists for 193nm lithography
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
Impact of thin resist processes on post-etch LER
- - Arpan P. Mahorowala
  - Dario L. Goldfarb
  - et al.
- 2003
- Microlithography 2003
Rational design in cyclic olefin resists for sub-100nm lithography
- - Wenjie Li
  - P. Rao Varanasi
  - et al.
- 2003
- Microlithography 2003