Publications

5 results for A.E. Zweber

Defects on high resolution negative-tone resist The revenge of the blobs
- - M.I. Sanchez
  - L.K. Sundberg
  - et al.
- 2013
- SPIE Photomask Technology + EUV Lithography 2013
Two-dimensional mask effects at the 14 nm logic node
- - A.E. Zweber
  - A.E. McGuire
  - et al.
- 2013
- SPIE Photomask Technology 2013
EUV mask line edge roughness
- - Amy E. Zweber
  - Emily Gallagher
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Two complementary methods to characterize long range proximity effects due to develop loading
- - Linda K. Sundberg
  - Greg M. Wallraff
  - et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
A method to characterize pattern density effects: Chemical flare and develop loading
- - Linda K. Sundberg
  - Gregory M. Wallraff
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010