Methods for joint optimization of mask and design targets for improving lithographic process window
- Shayak Banerjee
- Kanak B. Agarwal
- et al.
- 2013
- J. Micro/Nanolithogr. MEMS MOEMS
Publications
6 results for Michael Orshansky
Shape slack: A design-manufacturing co-optimization methodology using tolerance information
- Shayak Banerjee
- Kanak B. Agarwal
- et al.
- 2013
- J. Micro/Nanolithogr. MEMS MOEMS
Ground rule slack aware tolerance-driven optical proximity correction for local metal interconnects
- Shayak Banerjee
- Kanak Agarwal
- et al.
- 2010
- CICC 2010
Compensating non-optical effects using electrically-driven optical proximity correction
- Shayak Banerjee
- Kanak B. Agarwal
- et al.
- 2009
- SPIE Advanced Lithography 2009
Analytical modeling of SRAM dynamic stability
- Bin Zhang
- Ari Arapostathis
- et al.
- 2006
- ICCAD 2006
Gain-based technology mapping for minimum runtime leakage under input vector uncertainty
- Ashish Kumar Singh
- Murari Mani
- et al.
- 2006
- DAC 2006