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A holistic characterization methodology for stochastic printing failures in EUV contact holesJennifer ChurchBrad Austinet al.2021ASMC 2021
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitchJennifer ChurchLuciana Meliet al.2020J. Micro/Nanolithogr. MEMS MOEMS
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Yield learning methodologies and failure isolation in ring oscillator circuit for CMOS technology researchVictor ChanKangguo Chenget al.2019IEEE Trans Semicond Manuf
Failure isolation in ring oscillator circuit and defect detection in CMOS technology researchVictor ChanM. Bergendahlet al.2019ASMC 2019