ETSOI CMOS for system-on-chip applications featuring 22nm gate length, sub-100nm gate pitch, and 0.08μm2 SRAM cell
- Kangguo Cheng
- A. Khakifirooz
- et al.
- 2011
- VLSI Technology 2011
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19 results for Hong He
ETSOI CMOS for system-on-chip applications featuring 22nm gate length, sub-100nm gate pitch, and 0.08μm2 SRAM cell
- Kangguo Cheng
- A. Khakifirooz
- et al.
- 2011
- VLSI Circuits 2011
Thermal budget reduction and throughput enhancement for CMOS Epi stressors via wet clean interface contamination evaluation and control
- Paul Brabant
- Keith Chung
- et al.
- 2011
- ASMC 2011
Extremely thin SOI (ETSOI) technology: Past, present, and future
- Kangguo Cheng
- A. Khakifirooz
- et al.
- 2010
- IEEE International SOI Conference 2010
Challenges and opportunities of extremely thin SOI (ETSOI) CMOS technology for future low power and general purpose system-on-chip applications
- A. Khakifirooz
- Kangguo Cheng
- et al.
- 2010
- VLSI-TSA 2010
Challenges and solutions of extremely thin SOI (ETSOI) for CMOS scaling to 22nm node and beyond
- Kangguo Cheng
- Ali Khakifirooz
- et al.
- 2010
- CSTIC 2010
Applications of epitaxy for semiconductor technology
- Devendra Sadana
- Stephen W. Bedell
- et al.
- 2010
- ECS Transactions
High strain embedded-SiGe via low temperature reduced pressure chemical vapor deposition
- Hong He
- Paul Brabant
- et al.
- 2012
- Thin Solid Films
Gas phase particle formation and elimination on Si (100) in low temperature reduced pressure chemical vapor deposition silicon-based epitaxial layers
- Manabu Shinriki
- Keith Chung
- et al.
- 2012
- Thin Solid Films