Publications

31 results for Sean Burns

Spacer-defined double patterning for 20-nm and beyond logic BEOL technology
- - Ryoung-Han Kim
  - Chiew-Seng Koay
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- - Guillaume Landie
  - Yongan Xu
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Overcoming the challenges of 22-nm node patterning through litho-design co-optimization
- - Martin Burkharde
  - J.C. Arnold
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Graded spin-on organic bottom antireflective coating for high NA lithography
- - Dario L. Goldfarb
  - Sean D. Burns
  - et al.
- 2008
- SPIE Advanced Lithography 2008
22 nm technology compatible fully functional 0.1 μm ² 6T-sram cell
- - B. Haran
  - A. Kumar
  - et al.
- 2008
- IEDM 2008
Graded spin-on organic bottom antireflective coating for high na immersion lithography
- - Dario L. Goldfarb
  - Libor Vyklicky
  - et al.
- 2008
- J. Photopolym. Sci. Tech.
32 NM Logic patterning options with immersion lithography
- - K. Lai
  - S. Burns
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Trilayer development for 193 nm immersion lithography
- - Sean Burns
  - Martin Burkhardt
  - et al.
- 2007
- J. Photopolym. Sci. Tech.
Dark field Double Dipole Lithography (DDL) for back-end-of-line processes
- - M. Burkhardt
  - Sean Burns
  - et al.
- 2007
- SPIE Advanced Lithography 2007