In situ analysis of the formation of thin TiSi2 (<50 nm) contacts in submicron CMOS structures during rapid thermal annealing
- L. Clevenger
- C. Cabral Jr.
- et al.
- 1995
- MRS Fall Meeting 1995
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162 results for Cyril Cabral
A comparison of C54-TiSi2 formation in blanket and submicron gate structures using in situ x-ray diffraction during rapid thermal annealing
- J. Bucchignano
- G.B. Stephenson
- et al.
- 1995
- Journal of Materials Research
A kinetic study of the C49 to C54 TiSi2 conversion using electrical resistivity measurements on single narrow lines
- K.L. Saenger
- C. Cabral
- et al.
- 1995
- Journal of Applied Physics
In situ x-ray diffraction analysis of the C49-C54 titanium silicide phase transformation in narrow lines
- R.A. Roy
- L. Clevenger
- et al.
- 1995
- Applied Physics Letters
Crystallographic texture change during abnormal grain growth in Cu-Co thin films
- J.M.E. Harper
- J. Gupta
- et al.
- 1994
- Applied Physics Letters
Kinetics of Al grain growth, Al2Cu precipitation, and dissolution in blanket thin films and fine lines
- E.G. Colgan
- K.P. Rodbell
- et al.
- 1994
- Journal of Applied Physics
Giant magnetoresistance of dilute Cu(Co) granular films
- R.J. Gambino
- T.R. McGuire
- et al.
- 1994
- Journal of Applied Physics
Giant magnetoresistance in Co/Cu multilayers after annealing
- T.R. McGuire
- J.M.E. Harper
- et al.
- 1994
- Journal of Applied Physics
Study of C49-TiSi2 and C54-TiSi2 formation on doped polycrystalline silicon using in situ resistance measurements during annealing
- L. Clevenger
- R. Mann
- et al.
- 1994
- Journal of Applied Physics
In-situ x-ray diffraction and resistivity analysis of CoSi2 phase formation with and without a Ti interlayer at rapid thermal annealing rates
- C. Cabral Jr.
- L. Clevenger
- et al.
- 1994
- MRS Fall Meeting 1994